Thickness effect on the structure, grain size, and local piezoresponse of self-polarized lead lanthanum zirconate titanate thin films / Melo M.,Araujo E. B.,Shvartsman V. V.,Shur V. Ya.,Kholkin A. L. // JOURNAL OF APPLIED PHYSICS. - 2016. - V. 120, l. 5.

ISSN/EISSN:

0021-8979 / 1089-7550

Type:

Article

Abstract:

Polycrystalline lanthanum lead zirconate titanate (PLZT) thin films were deposited on Pt/TiO2/SiO2/Si substrates to study the effects of the thickness and grain size on their structural and piezoresponse properties at nanoscale. Thinner PLZT films show a slight (100)-orientation tendency that tends to random orientation for the thicker film, while microstrain and crystallite size increases almost linearly with increasing thickness. Piezoresponse force microscopy and autocorrelation function technique were used to demonstrate the existence of local self-polarization effect and to study the thickness dependence of correlation length. The obtained results ruled out the bulk mechanisms and suggest that Schottky barriers near the film-substrate are likely responsible for a build-in electric field in the films. Larger correlation length evidence that this build-in field increases the number of coexisting polarization directions in larger grains leading to an alignment of macrodomains in thinner films. Published by AIP Publishing.

Author keywords:

FORCE MICROSCOPY; PIEZOELECTRIC PROPERTIES; RIETVELD REFINEMENT; PLZT; CERAMICS; DIFFRACTION; DISORDER; BEHAVIOR; STRESS; STATE

DOI:

10.1063/1.4960137

Web of Science ID:

ISI:000383091600021

Соавторы в МНС:

Другие поля

Поле	Значение
Month	AUG 7
Publisher	AMER INST PHYSICS
Address	1305 WALT WHITMAN RD, STE 300, MELVILLE, NY 11747-4501 USA
Language	English
Article-Number	054101
EISSN	1089-7550
Keywords-Plus	FORCE MICROSCOPY; PIEZOELECTRIC PROPERTIES; RIETVELD REFINEMENT; PLZT; CERAMICS; DIFFRACTION; DISORDER; BEHAVIOR; STRESS; STATE
Research-Areas	Physics
Web-of-Science-Categories	Physics, Applied
Author-Email	eudes@dfq.feis.unesp.br
ResearcherID-Numbers	Araujo, E/A-7104-2013 Shvartsman, Vladimir/J-4210-2014 Kholkin, Andrei/G-5834-2010 Shur, Vladimir/J-9078-2015
ORCID-Numbers	Shvartsman, Vladimir/0000-0002-7155-2473 Kholkin, Andrei/0000-0003-3432-7610
Number-of-Cited-References	35
Usage-Count-Last-180-days	9
Usage-Count-Since-2013	20
Journal-ISO	J. Appl. Phys.
Doc-Delivery-Number	DV7BS