Surface engineering using kumada catalyst-transfer polycondensation (KCTP): Preparation and structuring of poly(3-hexylthiophene)-based graft copolymer brushes / Khanduyeva N., Senkovskyy V., Beryozkina T., Horecha M., Stamm M., Uhrieh C., Riede M., Leo K., Kiriy A. // Journal of the American Chemical Society. - 2009. - V. 131, l. 1. - P. 153-161.

ISSN:
00027863
Type:
Article
Abstract:
Poly(4-vinylpyridine)-block-poly(4-iodo-styrene), P4VP-b-PS(l), block copolymers obtained by iodination of readily available P4VP-b-PS block copolymers strongly adhere to variety of polar substrates including Si wafers, glasses, or metal oxide surfaces by a polar P4VP block, forming polymer brushes of moderately stretched PS(I) chains. Kumada catalyst-transfer polycondensation (KCTP) from the P4VP-b- PS(I) brushes results into planar brushes of the graft copolymer in which relatively short (̃10 nm) poly(3- hexylthiophene), P3HT, grafts emanate from the surface-tethered PS(I) chains. Grafting of the P3HT leads to significant stretching of the PS(I) backbone as a result of increased excluded volume interactions. Specific adsorption of the P4VP block to polar surfaces was utilized in this work to pattern the P4VP25-Jb-PS(l) 350 brush. The microscopically structured P4VP25-b-PS(l) 350 brush was converted into the respectively patterned P4VP-PS(l)-g-P3HT one using KCTP. We also demonstrated that KCTP from functional block copolymers is an attractive option for nanostructuring with polymer brushes. P4VP 75-b-PS(l)313 micelles obtained in selective solvent for the PS(I) block form a quasi-ordered hexagonal array on Si wafer. The P4VP 75-b PS(I)313 monolayer preserves the characteristic quasi-regular arrangement of the micelles even after extensive rinsing with various solvents. Although the grafting of P3HT from the nanopatterned P4VP 75-b-PS(I)313 brush destroys the initial order, the particulate morphology in the resulting film is preserved. We believe that the developed method to structured brushes of conductive polymers can be further exploited in novel stimuli-responsive materials, optoectronic devices, and sensors. © 2009 American Chemical Society.
Author keywords:
Index keywords:
Conductive Polymer; Copolymer brushes; Excluded-volume interactions; Functional block copolymers; Hexagonal arrays; Metal oxide surfaces; Nano-structuring; Particulate morphology; Polar substrates; Po
DOI:
10.1021/ja8050734
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Affiliations Leibniz-Institut fur Polymerforschung Dresden E.v, Hohe Strasse 6, 01069 Dresden, Germany; Institut für Angewandte Photophysik, Technische Universität Dresden, Helmholtztrasse 10, 01062 Dresden, Germany
Chemicals/CAS silicon, 7440-21-3; poly(4 vinylpyridine), 25232-41-1, 9003-47-8; silicon dioxide, 10279-57-9, 14464-46-1, 14808-60-7, 15468-32-3, 60676-86-0, 7631-86-9; poly(3-hexylthiophene); poly(4-vinylpyridine), 25232-41-1; polyiodostyrene, 9037-49-4; Polystyrenes; Polyvinyls; Silicon Dioxide, 7631-86-9; Thiophenes
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Correspondence Address Kiriy, A.; Leibniz-Institut fur Polymerforschung Dresden E.v, Hohe Strasse 6, 01069 Dresden, Germany; email: kiriy@ipfdd.de
CODEN JACSA
PubMed ID 19128176
Language of Original Document English
Abbreviated Source Title J. Am. Chem. Soc.
Source Scopus