TRANSIENT MODEL OF DEPOSIT GROWTH AT NONEQUIPOTENTIAL ELECTRODES. / Rudoi V.M., Petrova N.A. // Soviet electrochemistry. - 1983. - V. 19, l. 6. - P. 657-661.

ISSN:

00385387

Type:

нет данных

Abstract:

A dynamic transient model is suggested for the growth of metal deposits at nonequipotential, high-resistance film-type electrodes when diffusion limitations are present. With this model one can calculate the specific characteristics of the electrochemical process from the time dependence of total current at the nonequipotential electrode.

Author keywords:

Index keywords:

ELECTROCHEMISTRY; ELECTROLYSIS; ELECTRODES

DOI:

нет данных

Смотреть в Scopus:

https://www.scopus.com/inward/record.uri?eid=2-s2.0-0020763005&partnerID=40&md5=6c4eefe38519c057d89ff7fcf6c9637f

Соавторы в МНС:

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Другие поля

Поле	Значение
Link	https://www.scopus.com/inward/record.uri?eid=2-s2.0-0020763005&partnerID=40&md5=6c4eefe38519c057d89ff7fcf6c9637f
Correspondence Address	Rudoi, V.M.
CODEN	SOECA
Language of Original Document	English
Abbreviated Source Title	Sov Electrochem
Source	Scopus