NICKEL ELECTRODEPOSITION ONTO FILM-TYPE ELECTRODES. / Zinigrad E.A., Rudoi V.M., Levin A.I. // Soviet electrochemistry. - 1980. - V. 16, l. 7. - P. 853-856.
ISSN:
00385387
Type:
нет данных
Abstract:
For the growth of nickel deposits on nonequipotential, film-type electrodes, a dynamic model is suggested which can be used to find the specific characteristics of tangential and normal component of the metal deposition current directly from the electrochemical measurements. The tangential (V//t) and normal (V//n) rate of nickel deposition in chloride electrolyte were determined separately. It was found that V//t is five orders of magnitude larger than V//n.