New broad beam gas ion source for industrial application / Gavrilov NV,Mesyats GA,Nikulin SP,Radkovskii GV,Elkind A,Perry AJ,Treglio JR // JOURNAL OF VACUUM SCIENCE \& TECHNOLOGY A-VACUUM SURFACES AND FILMS. - 1996. - V. 14, l. 3, 1. - P. 1050-1055.

ISSN/EISSN:

0734-2101 / нет данных

Type:

Article; Proceedings Paper

Abstract:

A source delivering a broad, high current ion beam compatible with both chemically active and inert has been developed which gives reliable, long term, maintenance-free operation. It uses a glow discharge with a cold cathode in a magnetic field where a dense uniform plasma is generated in large volumes at low gas pressures. Optimal selection of the electrode configuration and magnetic field ensures operation at pressures lower than 0.1 Pa in pulse-periodic mode (1-10 A discharge current, 1 ms pulse length, 25-50 Hz frequency), and continuous mode (discharge current up to 2 A). The current density of a 15-cm-diam beam can reach 10 mA cm(-2) in the former, and 1 mA cm(-2) in the latter. Tests with a 50-cm-diam discharge chamber show the uniformity of the ion emission current to be better than +/-10\%, confirming that the technology is scaleable, and that beams of up to 2000 cm(2) cross-sectional area can be obtained without loss of beam uniformity through appropriate design of the extraction system. The source is completely reactive gas-compatible, generating ion beams from oxygen, nitrogen, argon or ionized CH radicals (e.g., using C3H8). Mass-charge beam analysis shows the beams, generated to be of high purity (>99\%). Applications include low energy (1-3 keV) ion beam cleaning of glass, ceramic and metal surfaces prior to the deposition of protective and decorative coatings such as TiN and diamondlike carbon, ion beam assisted deposition, and high energy gas ion implantation using, e.g., guise-periodic beams of ions with energies up to 50 keV. (C) 1996 American Vacuum Society.

Author keywords:

TECHNOLOGY

DOI:

10.1116/1.580132

Web of Science ID:

ISI:A1996UR13400073

Соавторы в МНС:

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Другие поля

Поле	Значение
Month	MAY-JUN
Note	42nd National Symposium of the American-Vacuum-Society, MINNEAPOLIS, MN, OCT 16-20, 1995
Organization	Amer Vacuum Soc
Publisher	AMER INST PHYSICS
Address	CIRCULATION FULFILLMENT DIV, 500 SUNNYSIDE BLVD, WOODBURY, NY 11797-2999
Language	English
Keywords-Plus	TECHNOLOGY
Research-Areas	Materials Science; Physics
Web-of-Science-Categories	Materials Science, Coatings \& Films; Physics, Applied
ResearcherID-Numbers	Mesyats, Gennady/L-3138-2015 Nikulin, Sergey/S-4592-2016
ORCID-Numbers	Gavrilov, Nikolai/0000-0003-1542-0107
Number-of-Cited-References	16
Usage-Count-Since-2013	9
Journal-ISO	J. Vac. Sci. Technol. A-Vac. Surf. Films
Doc-Delivery-Number	UR134