Modelling the dynamic growth of copper and zinc dendritic deposits under the galvanostatic electrolysis conditions / Ostanina T. N.,Rudoi V. M.,Patrushev A. V.,Darintseva A. B.,Farlenkov A. S. // JOURNAL OF ELECTROANALYTICAL CHEMISTRY. - 2015. - V. 750, l. . - P. 9-18.

ISSN/EISSN:

1572-6657 / 1873-2569

Type:

Article

Abstract:

This paper investigates the process of crystallisation of the copper and zinc dendritic deposits under galvanostatic conditions on the rod electrode. The effect of the value of current and metal ion concentration in solutions on the growth dynamics of loose deposits is studied. It is shown that the current efficiency of the metal increases, and the growth rate decreases during the elongation of dendritic particles, and an increase in the surface area on which the electrocrystallisation takes place. Empirical equations for the quantitative description of changes in time of the lengths of the dendrites and the current efficiency of copper and zinc are proposed, which well approximate the experimental data obtained under various conditions of electrolysis. A phenomenological model is worked out that helps to calculate the variation of structural parameters in time (the number and the radius of tips of the dendrite branches) of the loose deposit growth and to determine the moment of transition from a loose deposit to a compact one. (C) 2015 Elsevier B.V. All rights reserved.

Author keywords:

Dendritic deposit; Zinc; Copper; Current efficiency; Phenomenological model; Empirical equation; Shell formation time HYDROGEN CODEPOSITION; ELECTRODEPOSITION; MECHANISM; MORPHOLOGY; REGIME; METALS

DOI:

10.1016/j.jelechem.2015.04.031

Web of Science ID:

ISI:000357755000002

Соавторы в МНС:

Другие поля

Поле	Значение
Month	AUG 1
Publisher	ELSEVIER SCIENCE SA
Address	PO BOX 564, 1001 LAUSANNE, SWITZERLAND
Language	English
EISSN	1873-2569
Keywords-Plus	HYDROGEN CODEPOSITION; ELECTRODEPOSITION; MECHANISM; MORPHOLOGY; REGIME; METALS
Research-Areas	Chemistry; Electrochemistry
Web-of-Science-Categories	Chemistry, Analytical; Electrochemistry
Author-Email	t.n.ostanina@urfu.ru vlmx@rambler.ru patrushev.xs666@mail.ru anyad@bk.ru a.farlenkov@yandex.ru
ResearcherID-Numbers	Farlenkov, Andrey/C-5426-2014
ORCID-Numbers	Farlenkov, Andrey/0000-0001-5507-7783
Number-of-Cited-References	26
Usage-Count-Last-180-days	1
Usage-Count-Since-2013	21
Journal-ISO	J. Electroanal. Chem.
Doc-Delivery-Number	CM5UR