Characterization of TiAlSiON coatings deposited by plasma enhanced magnetron sputtering: XRD, XPS, and DFT studies / Kamenetskih A. S.,Kukharenko A. I.,Kurmaev E. Z.,Skorikov N. A.,Gavrilov N. V.,Cholakh S. O.,Chukin A. V.,Zainullina V. M.,Korotin M. A. // SURFACE \& COATINGS TECHNOLOGY. - 2015. - V. 278, l. . - P. 87-91.

ISSN/EISSN:

0257-8972 / нет данных

Type:

Article

Abstract:

The results of characterization of TiAlSiON hard coatings deposited on ferric-chromium AISI 430 stainless steel by plasma enhanced magnetron sputtering are presented. The coating with maximum hardness (of 43 GPa) was obtained at the following optimal values of elemental concentrations: Si similar to 5 at.\%, Al similar to 15 at.\%, and Ti similar to 27 at.\%. The value of gaseous mixture (Ar-N-2) pressure was of 0.13 Pa and the value of partial pressure of oxygen (02) was 1.3 . 10(-3) Pa. The X-ray diffraction (XRD) measurements showed the presence of Ti(Al)N. High-energy resolved XPS spectra of core levels revealed the formation of Ti-N, Ti-O-N, Si-N and Al-O-N bonds. Comparison of XPS valence band spectra with specially performed density functional theory calculations for disordered Ti0.5Al0.5 N-1 (-) O-x(x) (0 <= x <= 0.3) phases demonstrated that a Ti(Al)OxNy phase is formed on the surface of AISI430 steel upon the plasma enhanced magnetron sputtering, which can provide a good combination of high hardness and additional oxidation resistance of this material. (C) 2015 Elsevier B.V. All rights reserved.

Author keywords:

TiAlON coatings; Magnetron sputtering; X-ray photoelectron spectra; Density functional theory; Electronic structure MECHANICAL-PROPERTIES; ION-BOMBARDMENT; SILICON-NITRIDE; THIN-FILMS; TIN FILMS; SI; MICROSTRUCTURE; RESISTANCE

DOI:

10.1016/j.surfcoat.2015.08.007

Web of Science ID:

ISI:000361934800012

Соавторы в МНС:

Другие поля

Поле	Значение
Month	SEP 25
Publisher	ELSEVIER SCIENCE SA
Address	PO BOX 564, 1001 LAUSANNE, SWITZERLAND
Language	English
Keywords-Plus	MECHANICAL-PROPERTIES; ION-BOMBARDMENT; SILICON-NITRIDE; THIN-FILMS; TIN FILMS; SI; MICROSTRUCTURE; RESISTANCE
Research-Areas	Materials Science; Physics
Web-of-Science-Categories	Materials Science, Coatings \& Films; Physics, Applied
Author-Email	kurmaev@ifmlrs.uran.ru
ResearcherID-Numbers	Kukharenko, Andrey/M-8256-2016 Skorikov, Nikolay/A-6728-2012 Cholakh, Seif/M-8221-2016 Kurmaev, Ernst/J-4254-2013 Korotin, Michael/J-3252-2013
ORCID-Numbers	Kukharenko, Andrey/0000-0003-3774-6909 Skorikov, Nikolay/0000-0002-3771-8708 Cholakh, Seif/0000-0002-9313-6614 Kurmaev, Ernst/0000-0003-4625-4930 Korotin, Michael/0000-0002-9603-8374 Gavrilov, Nikolai/0000-0003-1542-0107
Funding-Acknowledgement	Russian Scientific Foundation {[}14-22-00004]
Funding-Text	The results of experimental measurements of XPS spectra and calculations of electronic structure were supported by the grant of the Russian Scientific Foundation (project no. 14-22-00004).
Number-of-Cited-References	30
Usage-Count-Last-180-days	2
Usage-Count-Since-2013	24
Journal-ISO	Surf. Coat. Technol.
Doc-Delivery-Number	CS2XH